Meeting
the Vibration Challenges Of
Next-Generation
Photolithography Tools
Hal Amick and Ahmad Bayat
In the past, the vibration design process has been driven by the requirements for an acceptable ambient vibration environment for tools. However, the newest generation of photolithography tools, the "scanners" or "step-and-scan" systems, impose an additional requirement for the dynamic resistance properties of the tool's support points. This paper discusses the current scanner support criteria in terms of receptance spectra, and compares them with receptance measurements carried out in several fabs. Design philosophies are discussed for both floor structures and tool support pedestals.
Proceedings
of ESTECH 2001, 47th Annual Technical Meeting, IEST,
Phoenix, Arizona (April 2001)